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Performance-Aware Stress Engineering for Nano-scaled FETs

-15% su kodu: ENG15
94,08 
Įprasta kaina: 110,68 
-15% su kodu: ENG15
Kupono kodas: ENG15
Akcija baigiasi: 2025-03-03
-15% su kodu: ENG15
94,08 
Įprasta kaina: 110,68 
-15% su kodu: ENG15
Kupono kodas: ENG15
Akcija baigiasi: 2025-03-03
-15% su kodu: ENG15
2025-02-28 110.6800 InStock
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Knygos aprašymas

In the last couple of decades, the elastic strain engineering approach in nano-scaled silicon devices has been successfully implemented for different applications. Now a days, researchers are trying to incorporate such strain in different other materials such as Ge, GaAs, InGaAs, MoS2 etc. However, there are still some interesting areas remaining to extract further advantages of such strain technologies, which can be exploited for development of high performance CMOS devices and circuits, keeping the manufacturing cost and time under control.

Informacija

Autorius: Kunal Sinha, Sanatan Chattopadhyay, Hafizur Rahaman,
Leidėjas: LAP LAMBERT Academic Publishing
Išleidimo metai: 2019
Knygos puslapių skaičius: 216
ISBN-10: 6139585449
ISBN-13: 9786139585441
Formatas: 220 x 150 x 13 mm. Knyga minkštu viršeliu
Kalba: Anglų

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